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Microlab 科研型多功能直写光刻系统
Microlab 科研型多功能直写光刻系统
Microlab 科研型多功能直写光刻系统
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Microlab 科研型多功能直写光刻系统
技术特点
可选配光源:405nmLED、405nmLD、355nmDPSSL
支持4-8英寸幅面基板
高刷新空间光调制无掩模直写
自动聚焦
3D形貌曝光、干涉曝光、偏振曝光
多模式曝光(扫描式曝光、步进式曝光)
多任务模式自动运行
GDSII、BMP、STL等文件格式支持
规格参数
* 参数取决于选配工件台幅面
* 具体指标因工艺差异有所不同
应用示例
只有注册用户才能使用该功能
